The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Jul. 01, 2010
Stefan Hengster, Frankfurt, DE;
Stefan Hengster, Frankfurt, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
To produce a meniscus lens from synthetic quartz glass for use in a microlithography apparatus, which lens has a first optical surface () and a second optical surface () with the same direction of curvature as the first optical surface (), SiO2 particles are formed by oxidation or flame hydrolysis of a silicon-containing starting compound and deposited layer by layer on a substrate to form a cylindrical SiO2 blank which contains layers with a surface normal extending in the direction of growth. To allow such layers, which have however the least possible adverse effect on optical or mechanical properties, it is proposed according to the invention that the blank is plastically worked in a hot forming process under the effect of a deforming force to form a preform (), which has at least the first curved surface () and in which the layers are curved in the direction of curvature, and that the meniscus lens is obtained from the preform.