The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Jun. 03, 2014
Azure Silicon Llc, Raleigh, NC (US);
Jacek Korec, Sunrise, FL (US);
Azure Silicon LLC, Raleigh, NC (US);
Abstract
A MOSFET includes an active region formed on an SOI substrate. A buried well is formed in the active region. A drain region having the first conductivity type is formed in the active region and spaced laterally from a source region and the buried well. A body region is formed in the active region between the source and drain regions on the buried well, and a drift region is formed in the active region between the drain and body regions on at least a portion of the buried well. A shielding structure is formed proximate the upper surface of the active region, overlapping a gate. During conduction, the buried well forms a PN junction with the drift region which, in conjunction with the shielding structure, depletes the drift region. The MOSFET is configured to sustain a linear mode of operation of an inversion channel formed under the gate.