The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Apr. 17, 2012
Shinichiro Fujitaka, Hitachi, JP;
Yusuke Fujii, Hitachi, JP;
Rintaro Fujimoto, Hitachinaka, JP;
Kazuo Hiramoto, Hitachiota, JP;
Hiroshi Akiyama, Hitachiota, JP;
Shinichiro Fujitaka, Hitachi, JP;
Yusuke Fujii, Hitachi, JP;
Rintaro Fujimoto, Hitachinaka, JP;
Kazuo Hiramoto, Hitachiota, JP;
Hiroshi Akiyama, Hitachiota, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A charged particle beam reduces treatment time in the uniform scanning or in the conformal layer stacking irradiation. In the uniform scanning, an optimum charged particle beam scan path for uniformly irradiating a collimator aperture area is calculated. In the conformal layer stacking irradiation, an optimum charged particle beam scan path for uniformly irradiating a multi-leaf collimator aperture area of each layer for each of the layers obtained by partitioning the target volume is calculated. Alternatively, a minimum irradiation field size that covers the multi-leaf collimator aperture area of each layer is calculated, and a scan path corresponding to the irradiation field size, prestored in a memory of a particle therapy control apparatus, is selected. The charged particle beam scan path is optimally changed in the lateral directions in conformity with the collimator aperture area in the uniform scanning or in each layer in the conformal layer stacking irradiation.