The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Jun. 06, 2006
Applicants:
Anil K. Bhowmick, Kharagpur, IN;
Amit Biswas, Mumbai, IN;
Samik Gupta, Bangalore, IN;
Raja Krishnamurthy, Bangalore, IN;
Nisha Preschilla, Bangalore, IN;
Inventors:
Anil K. Bhowmick, Kharagpur, IN;
Amit Biswas, Mumbai, IN;
Samik Gupta, Bangalore, IN;
Raja Krishnamurthy, Bangalore, IN;
Nisha Preschilla, Bangalore, IN;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 18/42 (2006.01); C08K 5/34 (2006.01); C08L 71/12 (2006.01); C08L 53/00 (2006.01); C08L 71/00 (2006.01); C08K 5/00 (2006.01);
U.S. Cl.
CPC ...
C08L 53/00 (2013.01); C08L 71/12 (2013.01); C08L 53/005 (2013.01); C08L 71/00 (2013.01); C08K 5/0008 (2013.01);
Abstract
A composition comprises a poly(arylene ether); a block copolymer comprising a first block and a second block wherein the first block comprises repeating aryl alkylene units and the second block comprises repeating alkylene units; and an ethylene-vinyl aliphatic acid copolymer wherein the poly(arylene ether) and the block copolymer form a dual phase co-continuous morphology.