The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Sep. 03, 2009
Masahiko Miyauchi, Settsu, JP;
Yuichi Ishida, Chofu, JP;
Toshio Ogasawara, Chofu, JP;
Rikio Yokota, Chofu, JP;
Masahiko Miyauchi, Settsu, JP;
Yuichi Ishida, Chofu, JP;
Toshio Ogasawara, Chofu, JP;
Rikio Yokota, Chofu, JP;
Kaneka Corporation, Osaka, JP;
Japan Aerospace Exporation Agency, Tokyo, JP;
Abstract
A novel terminally modified imide oligomer having excellent solubility in organic solvents, excellent solution storage stability, and excellent molding properties such as low melt viscosity. Also, a varnish obtained by dissolving the terminally modified imide oligomer in an organic solvent; a cure product obtained by using the terminally modified imide oligomer and having excellent thermal and mechanical characteristics such as heat resistance, elastic modulus, tensile strength at break and tensile elongation at break; a prepreg; and a fiber-reinforced laminate. The soluble terminally modified imide oligomer is represented by general formula (1). In the formula, Rand Reach represents a divalent aromatic diamine residue; Rand Reach represents a tetravalent aromatic tetracarboxylic acid residue; Rand Reach represents a hydrogen atom or a phenyl group, with Ror Rbeing a phenyl group; m and n satisfy the following relations: m≧1, n≧0, 1≦m+n≦20 and 0.05≦m/(m+n)≦1; and the repeating units may be arranged in blocks or randomly.