The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Nov. 06, 2009
Applicants:
Hideaki Nitta, Chiyoda-ku, JP;
Junichi Shibata, Chiyoda-ku, JP;
Atsushi Sasaki, Chiyoda-ku, JP;
Masahiro Murakami, Chiyoda-ku, JP;
Inventors:
Hideaki Nitta, Chiyoda-ku, JP;
Junichi Shibata, Chiyoda-ku, JP;
Atsushi Sasaki, Chiyoda-ku, JP;
Masahiro Murakami, Chiyoda-ku, JP;
Assignee:
Teijin Chemicals, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); B29C 47/88 (2006.01); G02B 5/30 (2006.01); B29C 55/06 (2006.01); B29K 69/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3083 (2013.01); B29K 2069/00 (2013.01); B29K 2995/0032 (2013.01); B29C 55/06 (2013.01);
Abstract
A retardation film which has few foreign matter defects and small retardation nonuniformity and meets the required quality of a retardation film is provided with high productivity at a low cost by melt extruding a polycarbonate. The retardation film obtained by stretching and orienting a melt extruded film of a polycarbonate is characterized in that: