The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Jul. 18, 2008
Matthew R. Robinson, San Jose, CA (US);
Jeroen K. J. Van Duren, San Francisco, CA (US);
Craig Leidholm, Sunnyvale, CA (US);
Brian M. Sager, Menlo Park, CA (US);
Matthew R. Robinson, San Jose, CA (US);
Jeroen K. J. Van Duren, San Francisco, CA (US);
Craig Leidholm, Sunnyvale, CA (US);
Brian M. Sager, Menlo Park, CA (US);
aeris CAPITAL Sustainable IP Ltd., Grand Cayman, KY;
Abstract
Methods and devices are provided for high-throughput printing of semiconductor precursor layer from microflake particles. In one embodiment, the method comprises of transforming non-planar or planar precursor materials in an appropriate vehicle under the appropriate conditions to create dispersions of planar particles with stoichiometric ratios of elements equal to that of the feedstock or precursor materials, even after settling. In particular, planar particles disperse more easily, form much denser coatings (or form coatings with more interparticle contact area), and anneal into fused, dense films at a lower temperature and/or time than their counterparts made from spherical nanoparticles. These planar particles may be microflakes that have a high aspect ratio. The resulting dense film formed from microflakes are particularly useful in forming photovoltaic devices.