The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2014

Filed:

Oct. 22, 2012
Applicant:

Essilor International (Compagnie Generale D'optique), Charenton-le-Pont, FR;

Inventors:

Philippe Roisin, Charenton-le-Pont, FR;

Michele Thomas, Charenton-le-Poont, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); G02B 1/11 (2006.01); G02B 1/12 (2006.01);
U.S. Cl.
CPC ...
B05D 5/061 (2013.01); G02B 1/115 (2013.01); G02B 1/12 (2013.01);
Abstract

The invention relates to a method for producing an optical article having antireflection or reflective properties and comprising a substrate having at least one main surface, comprising the step of depositing an sub-layer onto a substrate's main surface, the step of treating the sub-layer by ionic bombardment and the step of depositing onto said sub-layer a multilayered stack comprising at least one high refractive index layer and at least one low refractive index layer. According to a preferred embodiment, the deposition of the sub-layer is conducted in a vacuum chamber in which a gas is supplied during the deposition step.


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