The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Oct. 26, 2009
Koji Ikuta, Aichi, JP;
Yoshinori Inoue, Aichi, JP;
Koji Ikuta, Aichi, JP;
Yoshinori Inoue, Aichi, JP;
Japan Science and Technology Agency, Saitama, JP;
Abstract
Three-dimensional microstereolithographic objects fabricated by microstereolithography are exposed to UV light for one hour to accelerate hardening. The structures are then heated at 175° C. or above for at least 6 hours. The heating temperature may exceed the glass transition temperature, which is the index of thermal softening temperature of materials. The present invention relates to three-dimensional microstructures formed by microstereolithography. Deformation due to a structure's own weight, which generally poses a problem in heat treatment, is reduced with microstructures due to the size effect. As a result, the dimensions of the three-dimensional structure fabricated by the present invention remain almost unchanged before and after the heat treatment.