The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Dec. 22, 2005
Applicants:
Min Yan, Ballston Lake, NY (US);
Ahmet Gun Erlat, Clifton Park, NY (US);
Jie Liu, Niskayuna, NY (US);
Inventors:
Min Yan, Ballston Lake, NY (US);
Ahmet Gun Erlat, Clifton Park, NY (US);
Jie Liu, Niskayuna, NY (US);
Assignee:
General Electric Company, Niskayuna, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/32 (2006.01); C23C 14/35 (2006.01); C23C 14/04 (2006.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
C23C 14/044 (2013.01); C23C 14/35 (2013.01); C23C 14/086 (2013.01);
Abstract
A method and system for DC magnetron sputtering deposition of films on plastic substrates. The method includes using a shield to block deposition in a spatial region corresponding to a plasma region formed during magnetron sputtering. An optoelectronic device including an amorphous electrode film is also disclosed.