The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Nov. 02, 2010
Applicant:

Parag Havaldar, Culver City, CA (US);

Inventor:

Parag Havaldar, Culver City, CA (US);

Assignees:

Sony Corporation, Tokyo, JP;

Sony Pictures Technologies Inc, Culver City, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/36 (2006.01); G06T 13/40 (2011.01); G06T 7/20 (2006.01);
U.S. Cl.
CPC ...
G06T 13/40 (2013.01); G06T 2207/30204 (2013.01); G06T 2207/30201 (2013.01); G06T 7/2046 (2013.01);
Abstract

Capturing facial surface using marker patterns laid out on the facial surface by adapting the marker patterns to contours of the facial surface and motion range of a head including: generating a facial action coding system (FACS) matrix by capturing FACS poses; generating a pattern to wrap over the facial surface using the FACS poses as a guide; capturing and tracking marker motions of the pattern; stabilizing the marker motions of the pattern using a head stabilization transform to remove head motions from the marker motions; and generating and applying a plurality of FACS matrix weights to the stabilized marker motions.


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