The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
May. 16, 2012
Nobuyuki Koike, Miyagi, JP;
Masatoshi Sasaki, Miyagi, JP;
Naoki Hanashima, Miyagi, JP;
Akio Takada, Miyagi, JP;
Takatoshi Yamada, Miyagi, JP;
Nobuyuki Koike, Miyagi, JP;
Masatoshi Sasaki, Miyagi, JP;
Naoki Hanashima, Miyagi, JP;
Akio Takada, Miyagi, JP;
Takatoshi Yamada, Miyagi, JP;
Dexerials Corporation, Tokyo, JP;
Abstract
A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate, an interface anti-reflection film groupand an obliquely vapor deposited film. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film groupis higher than the refractive index of the transparent substrateand lesser than that of the obliquely vapor deposited film