The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
Oct. 28, 2011
Applicant:
Daiki Yamatani, Gotenba, JP;
Inventor:
Daiki Yamatani, Gotenba, JP;
Assignee:
Ushio Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/42 (2006.01); G03F 7/20 (2006.01); G01J 1/06 (2006.01); G02B 27/09 (2006.01); G01J 1/58 (2006.01);
U.S. Cl.
CPC ...
G01J 1/58 (2013.01); G03F 7/70033 (2013.01); G01J 1/4257 (2013.01); G01J 1/429 (2013.01); G01J 1/06 (2013.01); G02B 27/0988 (2013.01);
Abstract
An extreme ultraviolet light source device, comprising a collector mirror focusing extreme ultraviolet radiation at a focal point, wherein a porous plate having a plurality of through holes arranged such that only radiation focusing at said focal point passes is provided insertably between said collector mirror and said focal point on an optical axis of said collector mirror, and a detection means is provided to receive radiation having passed through said porous plate and to detect an intensity of said received radiation, and a method for detecting an irradiance distribution in an extreme ultraviolet light source device.