The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Nov. 21, 2008
Applicants:

Ahmed A. Busnaina, Ashland, MA (US);

Joey L. Mead, Carlisle, MA (US);

Carol M. F. Barry, Tyngsborough, MA (US);

Ming Wei, Lowell, MA (US);

Inventors:

Ahmed A. Busnaina, Ashland, MA (US);

Joey L. Mead, Carlisle, MA (US);

Carol M. F. Barry, Tyngsborough, MA (US);

Ming Wei, Lowell, MA (US);

Assignees:

Northeastern University, Boston, MA (US);

University of Massachusetts, Boston, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); C40B 60/12 (2006.01); B82Y 40/00 (2011.01); B05D 1/18 (2006.01); B82Y 10/00 (2011.01); C40B 40/02 (2006.01); C40B 40/06 (2006.01); C40B 40/10 (2006.01); G01N 35/00 (2006.01); B05D 3/14 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
B02Y 30/00 (2013.01); G03F 7/00 (2013.01); G01N 2035/00158 (2013.01); G03F 7/004 (2013.01); B05D 3/141 (2013.01); B82Y 40/00 (2013.01); B05D 1/185 (2013.01); G01N 2033/0096 (2013.01); B82Y 10/00 (2013.01); G03F 7/0002 (2013.01); Y10S 977/888 (2013.01);
Abstract

Nanoscale patterns prepared by lithography are used to direct the self-assembly of amphiphilic molecules to form patterned nanosubstrates having a desired distribution of chemical functional moieties. These patterns can be fabricated over a large area and require no special limitations on the chemistry the assembled amphiphiles. Hydrophilic/hydrophobic patterns can be created and used to direct the deposition of a single functional component to specific regions of the surface or to selectively assemble polymer blends to desired sites in a one step fashion with high specificity and selectivity. The selective deposition of functional moieties on a patterned surface can be based on electrostatic forces, hydrogen bonding, or hydrophobic interactions. The methods and patterned nanosubstrates of the invention can be used in the assembly of functional polymer systems, polyelectrolytes, biomolecules, conducting polymers, colloids and nanoparticles, and find wide technological applications in biosensors, biochips, photonics and electronics.


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