The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

May. 07, 2012
Applicants:

Matthias Erhard Bahlke, Cambridge, MA (US);

Marc A. Baldo, Lexington, MA (US);

Hiroshi Antonio Mendoza, Cambridge, MA (US);

Inventors:

Matthias Erhard Bahlke, Cambridge, MA (US);

Marc A. Baldo, Lexington, MA (US);

Hiroshi Antonio Mendoza, Cambridge, MA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0016 (2013.01);
Abstract

Method for making a patterned thin film of an organic semiconductor. The method includes condensing a resist gas into a solid film onto a substrate cooled to a temperature below the condensation point of the resist gas. The condensed solid film is heated selectively with a patterned stamp to cause local direct sublimation from solid to vapor of selected portions of the solid film thereby creating a patterned resist film. An organic semiconductor film is coated on the patterned resist film and the patterned resist film is heated to cause it to sublime away and to lift off because of the phase change.


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