The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Nov. 11, 2011
Applicants:

Myoung-hwan Cha, Uiwang-si, KR;

Jong-hwa Lee, Uiwang-si, KR;

Mi-ra Im, Uiwang-si, KR;

Min-kook Chung, Uiwang-si, KR;

Ji-young Jeong, Uiwang-si, KR;

Hyun-yong Cho, Uiwang-si, KR;

Hwan-sung Cheon, Uiwang-si, KR;

Inventors:

Myoung-Hwan Cha, Uiwang-si, KR;

Jong-Hwa Lee, Uiwang-si, KR;

Mi-Ra Im, Uiwang-si, KR;

Min-Kook Chung, Uiwang-si, KR;

Ji-Young Jeong, Uiwang-si, KR;

Hyun-Yong Cho, Uiwang-si, KR;

Hwan-Sung Cheon, Uiwang-si, KR;

Assignee:

Cheil Industries Inc., Gumi-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/06 (2006.01); G03C 1/00 (2006.01); G03F 7/004 (2006.01); G03F 7/008 (2006.01); G03F 7/016 (2006.01); G03F 7/031 (2006.01); G03F 7/023 (2006.01); H01L 23/29 (2006.01); G03F 7/022 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
H01L 23/296 (2013.01); G03F 7/0233 (2013.01); G03F 7/0226 (2013.01); G03F 7/0751 (2013.01);
Abstract

Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.


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