The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
Oct. 13, 2005
Applicant:
Harun H. Solak, Brugg, CH;
Inventor:
Harun H. Solak, Brugg, CH;
Assignee:
Eulitha AG, Villigen, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/68 (2006.01); G03F 7/22 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70408 (2013.01); G03F 7/2022 (2013.01); G03F 7/22 (2013.01); G03F 7/70325 (2013.01);
Abstract
A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.