The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Sep. 18, 2009
Applicant:

Jeremy E. Schaffer, Leo, IN (US);

Inventor:

Jeremy E. Schaffer, Leo, IN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 38/18 (2006.01); C22C 38/40 (2006.01); C22C 19/00 (2006.01); C22C 19/05 (2006.01); C22C 19/07 (2006.01); C21D 8/06 (2006.01); A61L 31/14 (2006.01); A61L 31/02 (2006.01); A61N 1/05 (2006.01); A61F 2/86 (2013.01);
U.S. Cl.
CPC ...
C22C 19/00 (2013.01); A61N 1/05 (2013.01); A61L 31/022 (2013.01); A61F 2/86 (2013.01); A61L 31/14 (2013.01);
Abstract

Fatigue damage resistant metal or metal alloy wires have a submicron-scale or nanograin microstructure that demonstrates improved fatigue damage resistance properties, and methods for manufacturing such wires. The present method may be used to form a wire having a nanograin microstructure characterized by a mean grain size that is 500 nm or less, in which the wire demonstrates improved fatigue damage resistance. Wire manufactured in accordance with the present process may show improvement in one or more other material properties, such as ultimate strength, unloading plateau strength, permanent set, ductility, and recoverable strain, for example. Wire manufactured in accordance with the present process is suitable for use in a medical device, or other high end application.


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