The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
Dec. 08, 2010
Applicant:
Cheol-su Kim, Yongin-si, KR;
Inventor:
Cheol-Su Kim, Yongin-si, KR;
Assignee:
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 1/02 (2006.01); C30B 29/06 (2006.01); C23C 16/56 (2006.01); H01L 21/02 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02532 (2013.01); C30B 29/06 (2013.01); C23C 16/56 (2013.01); C30B 1/023 (2013.01); H01L 21/02488 (2013.01); H01L 21/02667 (2013.01); C23C 16/24 (2013.01);
Abstract
An apparatus for manufacturing a polycrystalline silicon thin film, including a crystallization container filled with silicon oil, crystallization electrodes spaced apart from the crystallization container, and a conductive plate positioned between the crystallization electrodes and connected with the crystallization electrodes. Because an insulating layer between the amorphous silicon thin film and the conductive plate is formed by using silicon oil filled within the crystallization container, Joule-heating induced crystallization (JIC) can be performed through a simpler manufacturing process.