The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
May. 13, 2008
Applicant:
Yi Zheng, San Ramon, CA (US);
Inventor:
Yi Zheng, San Ramon, CA (US);
Assignee:
HGST Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/33 (2006.01); B44C 1/22 (2006.01); G11B 5/31 (2006.01); G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
G11B 5/3163 (2013.01); G11B 5/1278 (2013.01); G11B 5/3116 (2013.01);
Abstract
A method in one approach includes forming a first layer of a nonmagnetic material over two sides of a structure, the first layer being substantially absent from above a top of the structure; depositing an overlayer of an etchable, nonmagnetic material over the first layer and the top of the structure; and etching the overlayer for substantially removing the overlayer from above the top of the structure, wherein a substantial portion of the overlayer remains along the two sides of the structure after the etching. Additional systems and methods are also presented.