The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Nov. 11, 2010
Applicants:

Reed Linde, El Dorado Hills, CA (US);

Dan Glotter, Moshav Shadma, IL;

Alexander Chufarovsky, Ashdod, IL;

Leonid Gurov, Rishon Le Zion, IL;

Inventors:

Reed Linde, El Dorado Hills, CA (US);

Dan Glotter, Moshav Shadma, IL;

Alexander Chufarovsky, Ashdod, IL;

Leonid Gurov, Rishon Le Zion, IL;

Assignee:

Optimal Plus Ltd, Nes-Zionna, IL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01C 9/00 (2006.01); G01R 31/00 (2006.01); G01R 31/28 (2006.01);
U.S. Cl.
CPC ...
G01R 31/2891 (2013.01);
Abstract

Systems and methods for deciding whether or not to indicate misalignment. In some examples, an analysis of parametric data relating to tests sensitive to misalignment is performed in order to determine which data is incongruous and to identify corresponding probes or socket contacts as suspected misaligned. In some examples, additionally or alternatively, a spatial analysis quantifies the placement of a set of identified suspected misaligned probes, which were identified from pass/fail test data and/or parametric test data, with respect to a contiguous or non-contiguous area on one or more wafers.


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