The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Nov. 30, 2011
Applicants:

Koji Tsunekawa, Tokyo, JP;

Yoshinori Nagamine, Tama, JP;

Shinji Furukawa, San Jose, CA (US);

Inventors:

Koji Tsunekawa, Tokyo, JP;

Yoshinori Nagamine, Tama, JP;

Shinji Furukawa, San Jose, CA (US);

Assignee:

Canon Anelva Corporation, Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27B 5/14 (2006.01); F27B 5/16 (2006.01); F27D 5/00 (2006.01); H01L 21/68 (2006.01); H01L 43/12 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6719 (2013.01); H01L 21/67115 (2013.01); H01L 21/67109 (2013.01); H01L 43/12 (2013.01);
Abstract

The present invention provides a vacuum heating/cooling apparatus capable of rapidly heating and also rapidly cooling only a substrate while a high vacuum degree is maintained after film-formation processing. The vacuum heating/cooling apparatus according to an embodiment of the present invention includes a vacuum chamber (), a halogen lamp () which emits heating light, a quartz window () for allowing the heating light to enter the vacuum chamber (), a substrate supporting base () having a cooling function, and a lift pin () which causes the substrate () to stand still at a heating position Pand a cooling position Pand moves the substrate () between the heating position Pand the cooling position P


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