The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Nov. 22, 2013
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventor:

Kyung Rok Kim, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 1/04 (2006.01); H04N 1/028 (2006.01); G03G 15/04 (2006.01); G03G 15/02 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G03G 15/0266 (2013.01); H04N 1/02835 (2013.01); H04N 1/04 (2013.01); H04N 1/0282 (2013.01); H04N 1/02815 (2013.01); G03G 15/04036 (2013.01); G02B 6/0001 (2013.01);
Abstract

An image forming apparatus employing an illuminator configured to irradiate light to a photosensitive body to change a level of electrical potential of the photosensitive body. The illuminator includes at least one light source configured to generate light and a light guide configured to guide the light received from the light source toward the photosensitive body. The light guide includes at least one incidence face and an emission face. The at least one incidence face faces the light source in a main scanning direction to receive the light from the light source into the light guide. The light exits from the light guide through the emission face toward the photosensitive body. The emission face includes a diffusion pattern having a plurality of semi-cylindrical structures along a width direction of the light guide. A radius of curvature of the semi-cylindrical structures increases away from the at least one light source.


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