The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Jan. 28, 2010
Zhaowei Liu, San Diego, CA (US);
Zhaowei Liu, San Diego, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Disclosed are systems, apparatus, methods and devices, including a method that includes generating two or more sequential surface plasmon interference patterns, at least one of the two or more sequential surface plasmon interference patterns being different from another of the two or more sequential surface plasmon interference patterns, and capturing respective images of a specimen resulting from the interference patterns. Also disclosed is a method that includes generating two or more sequential optical interference patterns, at least one of the two or more sequential optical interference patterns being different from another of the interference patterns, and removing from each of the generated interference patterns, using a beam stopper, a corresponding zero-order diffraction light component included in the respective generated patterns to obtain resultant corresponding two or more sequential optical interference patterns, directed at a specimen, with missing respective zero-order light components.