The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Oct. 19, 2010
Applicant:
Issei Tanaka, Yokohama, JP;
Inventor:
Issei Tanaka, Yokohama, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/00 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0257 (2013.01);
Abstract
Providing a method for measuring wavefront aberration measured by detecting light that is emanated from a light source, incident on a test lens, and transmitted through the test lens, the method comprising steps of: measuring wavefront aberration in a state where an aperture stop of the test lens is fully opened; measuring a position of the center of a pupil of the test lens in a state where the aperture stop is stopped down; and expanding wavefront aberration by polynomials with making the position of the center of the pupil to be an origin, and a wavefront aberration measuring apparatus.