The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Jul. 29, 2011
Kenichi Tsujisawa, Mie-ken, JP;
Hiroshi Matsushita, Mie-ken, JP;
Takayoshi Otake, Mie-ken, JP;
Hideyuki Oishi, Mie-ken, JP;
Akira Ogawa, Mie-ken, JP;
Koji Washiyama, Mie-ken, JP;
Kenichi Tsujisawa, Mie-ken, JP;
Hiroshi Matsushita, Mie-ken, JP;
Takayoshi Otake, Mie-ken, JP;
Hideyuki Oishi, Mie-ken, JP;
Akira Ogawa, Mie-ken, JP;
Koji Washiyama, Mie-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of an exposure optical system at the time of exposure. The method can include making a determination on the inclination amount based on a predetermined condition. The method can include making a determination on the correction amount based on the predetermined condition. In addition, the method can include issuing an alarm when the inclination amount and the correction amount both satisfy the condition.