The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Mar. 08, 2010
Jacobus Hubertus Theodoor Jamar, Vessem, NL;
Andries Rijfers, Kamerik, NL;
Borgert Kruizinga, Zoetermeer, NL;
Jentske D. Kooistra, Delft, NL;
Mark Herman Else Vaes, Eindhoven, NL;
Jacobus Hubertus Theodoor Jamar, Vessem, NL;
Andries Rijfers, Kamerik, NL;
Borgert Kruizinga, Zoetermeer, NL;
Jentske D. Kooistra, Delft, NL;
Mark Herman Else Vaes, Eindhoven, NL;
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO, Delft, NL;
DSM IP Assets B.V., Heerlen, NL;
Abstract
The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.