The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Sep. 11, 2009
Applicants:

Hisayuki Kuwahara, Kanagawa, JP;

Tomomichi Kanda, Niigata, JP;

Shun Ogawa, Kanagawa, JP;

Shinichi Ayuba, Kanagawa, JP;

Kentaro Ishii, Kanagawa, JP;

Takahiko Sumino, Kanagawa, JP;

Inventors:

Hisayuki Kuwahara, Kanagawa, JP;

Tomomichi Kanda, Niigata, JP;

Shun Ogawa, Kanagawa, JP;

Shinichi Ayuba, Kanagawa, JP;

Kentaro Ishii, Kanagawa, JP;

Takahiko Sumino, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 69/28 (2006.01);
U.S. Cl.
CPC ...
C08G 69/28 (2013.01);
Abstract

A method of producing polyamide by the direct polycondensation of a diamine component and a dicarboxylic acid component without using a solvent, such as water. The diamine component containing 70 mol % or more of p-xylylenediamine is added to a reaction system containing the dicarboxylic acid component under pressure while maintaining the reaction system in a molten state. After the addition of the diamine component, the pressure of the reaction system is reduced to atmospheric pressure over 50 min or more at a pressure falling speed of 1.0 MPa/h or less. By the production method, polyamide with a small molecular weight dispersion is easily produced.


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