The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Jun. 17, 2011
Applicants:

Christoph Steeneck, Dossenheim, DE;

Christian Gege, Mauer, DE;

Frank Richter, HD-Handschuhsheim, DE;

Heiko Kroth, Stadecken-Elsheim, DE;

Matthias Hochgürtel, Schriesheim, DE;

Michael Essers, Bergisch Gladbach, DE;

Joshua Van Veldhuizen, Seattle, WA (US);

Bert Nolte, Aachen, DE;

Brian M. Gallagher, Jr., Merrimac, MA (US);

Tim Feuerstein, Neckargemeund, DE;

Matthias Schneider, Dossenheim, DE;

Torsten Arndt, Bensheim, DE;

Hongbo Deng, Southborough, MA (US);

Ralf Biesinger, Ludwigshafen, DE;

Xinyuan Wu, Newton, MA (US);

Harald Bluhm, Arnsberg-Neheim, DE;

Irving Sucholeiki, Winchester, MA (US);

Arthur G. Taveras, Southborough, MA (US);

Inventors:

Christoph Steeneck, Dossenheim, DE;

Christian Gege, Mauer, DE;

Frank Richter, HD-Handschuhsheim, DE;

Heiko Kroth, Stadecken-Elsheim, DE;

Matthias Hochgürtel, Schriesheim, DE;

Michael Essers, Bergisch Gladbach, DE;

Joshua van Veldhuizen, Seattle, WA (US);

Bert Nolte, Aachen, DE;

Brian M. Gallagher, Jr., Merrimac, MA (US);

Tim Feuerstein, Neckargemeund, DE;

Matthias Schneider, Dossenheim, DE;

Torsten Arndt, Bensheim, DE;

Hongbo Deng, Southborough, MA (US);

Ralf Biesinger, Ludwigshafen, DE;

Xinyuan Wu, Newton, MA (US);

Harald Bluhm, Arnsberg-Neheim, DE;

Irving Sucholeiki, Winchester, MA (US);

Arthur G. Taveras, Southborough, MA (US);

Assignee:

Amgen Inc., Thousand Oaks, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N 43/90 (2006.01); A61K 31/519 (2006.01); C07D 487/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates generally to amide containing heterobicyclic compounds having the following formulas: wherein R, R, D, and Q are as defined in the specification. More particularly, the present invention provides a new class of amide containing heterobicyclic compounds, that exhibit an increased potency in relation to currently known MMP-13 and MMP-3 inhibitors.


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