The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Aug. 11, 2011
Applicants:

Stephen Yue, Eugene, OR (US);

Robert Weber, San Francisco, CA (US);

Xiangxu Kong, Foster City, CA (US);

Andrei Fedorov, San Mateo, CA (US);

John Lyle, Redwood Shores, CA (US);

Inventors:

Stephen Yue, Eugene, OR (US);

Robert Weber, San Francisco, CA (US);

Xiangxu Kong, Foster City, CA (US);

Andrei Fedorov, San Mateo, CA (US);

John Lyle, Redwood Shores, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 5/00 (2006.01); C12Q 1/68 (2006.01); C12Q 1/25 (2006.01); G01N 33/52 (2006.01); G01N 33/543 (2006.01);
U.S. Cl.
CPC ...
G01N 33/52 (2013.01); C12Q 1/25 (2013.01); G01N 33/54373 (2013.01); G01N 2333/91245 (2013.01); G01N 2333/916 (2013.01);
Abstract

Compositions, devices, systems and methods for reducing and/or preventing photo-induced damage of one or more reactants in an illuminated analytical reaction by addition of one or more photoprotective compounds to the reaction mixture and allowing the reaction to proceed for a period that is less than a photo-induced damage threshold period.


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