The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Feb. 13, 2012
Applicants:

Dae Sik Lee, Daejeon, KR;

Jun BO Yoon, Daejeon, KR;

Dong Hoon Choi, Daejeon, KR;

Byung Kee Lee, Daejeon, KR;

Moon Youn Jung, Daejeon, KR;

Seung Hwan Kim, Daejeon, KR;

Inventors:

Dae Sik Lee, Daejeon, KR;

Jun Bo Yoon, Daejeon, KR;

Dong Hoon Choi, Daejeon, KR;

Byung Kee Lee, Daejeon, KR;

Moon Youn Jung, Daejeon, KR;

Seung Hwan Kim, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B31D 3/00 (2006.01); B82Y 30/00 (2011.01); C23C 14/02 (2006.01); C23C 14/06 (2006.01); B82Y 40/00 (2011.01); C23C 16/56 (2006.01); C23F 1/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/06 (2013.01); B82Y 30/00 (2013.01); C23C 14/024 (2013.01); B82Y 40/00 (2013.01); C23C 16/56 (2013.01); C23F 1/02 (2013.01);
Abstract

In the present invention, a nanoporous membrane having a columnar structure is manufactured through a deposition technology used in a semiconductor process, and the size of a nanopore is adjusted by etching the lower surface of the manufactured nanoporous membrane or using a seed layer and a nanobead layer so that scaling up is available at a lowered process temperature and the size of the nanopore can be easily adjusted when manufacturing the nanoporous membrane having a columnar structure.


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