The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Jun. 13, 2012
Hongyu Zhao, Beijing, CN;
Xiaohong Zhang, Beijing, CN;
Likun Pei, Beijing, CN;
Bao Zhang, Beijing, CN;
Ruiting Wang, Beijing, CN;
Hongyu Zhao, Beijing, CN;
Xiaohong Zhang, Beijing, CN;
Likun Pei, Beijing, CN;
Bao Zhang, Beijing, CN;
Ruiting Wang, Beijing, CN;
Beijing Sevenstar Electronics Co., Ltd., Beijing, CN;
Abstract
The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.