The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Oct. 17, 2011
Applicants:

Seikou Abe, Osaka, JP;

Takashi Yazawa, Yamanashi, JP;

Inventors:

Seikou Abe, Osaka, JP;

Takashi Yazawa, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 17/04 (2006.01); B05C 17/06 (2006.01); B41M 1/12 (2006.01); B41F 21/12 (2006.01); B41F 15/26 (2006.01); B41F 15/08 (2006.01); H05K 3/12 (2006.01); H05K 1/02 (2006.01);
U.S. Cl.
CPC ...
B41F 15/08 (2013.01); H05K 2201/09918 (2013.01); B41F 15/26 (2013.01); H05K 3/1216 (2013.01); B41M 1/12 (2013.01); H05K 1/0269 (2013.01); H05K 2203/166 (2013.01);
Abstract

Prior to a mark imaging process executed for the purpose of detecting a position of recognition marks for positioning the substrate and the mask, an optical axis calibration processing process of detecting a horizontal relative position between imaging optical axes, and a surface correction data creation processing process of detecting a local positional deviation of the imaging optical axes, which is caused by the travel of the imaging unit, are executed. Before starting production, a production pre-start precision evaluation process for evaluating a substrate positioning precision is executed by using a verification substrate and a verification mask, and after starting the production, a production post-start precision evaluation process for evaluating a substrate positioning precision after starting the production is executed by using a commercial production substrate and a commercial production mask.


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