The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Jan. 11, 2011
Kohei Matsui, Tokyo, JP;
Ryosuke Yasui, Tokyo, JP;
Keiichi Tanaka, Osaka, JP;
Takenori Yoshizawa, Osaka, JP;
Kohei Matsui, Tokyo, JP;
Ryosuke Yasui, Tokyo, JP;
Keiichi Tanaka, Osaka, JP;
Takenori Yoshizawa, Osaka, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
An exposure method is provided. In (a) of FIG., exposure is performed while a substrateis being transported in the Y direction, to simultaneously form first layersand layersin first non-display regionsand the display region, respectively, on the substrate. Next, in (b) of FIG., the substrateis rotated by 90 degrees, and exposure is performed while the substrateis being transported in the X direction, to form second layersin second non-display regions. Subsequently, in (c) of FIG., proximity exposure is performed once on the substrateto simultaneously form third layerson the first layersin the first non-display regions, fourth layerson the second layersin the second non-display regions, and layersin the display region