The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

Mar. 29, 2012
Applicants:

Yufeng Weng, Osaka, JP;

Michael Brockley, Oxford, GB;

Inventors:

Yufeng Weng, Osaka, JP;

Michael Brockley, Oxford, GB;

Assignee:

Sharp Kabushiki Kaisha, Osaka-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); H01L 29/205 (2006.01); H01L 29/06 (2006.01); H01L 21/00 (2006.01); H01L 33/38 (2010.01); H01L 33/14 (2010.01); H01L 33/20 (2010.01);
U.S. Cl.
CPC ...
H01L 33/38 (2013.01); H01L 33/382 (2013.01); H01L 33/14 (2013.01); H01L 33/20 (2013.01); H01L 2933/0016 (2013.01);
Abstract

In a nitride semiconductor light-emitting device having an n-side and a p-side electrode pad formed on the same side of a substrate wherein current distribution in the light-emitting device is improved by forming branch electrodes extended from the p-side electrode pad (and the n-side electrode pad), when sheet resistance values of n-side and p-side layers in the device are low enough, contact resistance between a p-type nitride semiconductor layer and a current diffusion layer of a transparent conductive film formed thereon is reduced and in-plane distribution of the sheet resistance is made uniform whereby improving the optical output, by increasing in a prescribed condition the sheet resistance value of the current diffusion layer.


Find Patent Forward Citations

Loading…