The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Nov. 25, 2010
Jung Bum Choi, Cheongju-si, KR;
Jong Jin Lee, Cheongju-si, KR;
Jung Bum Choi, Cheongju-si, KR;
Jong Jin Lee, Cheongju-si, KR;
Chungbuk National University Industry-Academic Cooperation Foundation, Cheongju-Si, KR;
Abstract
The present invention relates to a multi-quantum dot device and a method of manufacturing the multi-quantum dot device. Further specifically, present invention relates to a multi-quantum dot device including a channel configured by patterning the top silicon layer of an SOI wafer to have a P-type silicon region formed by connecting a transversal region and a longitudinal region and a plurality of N-type silicon regions; gates including a plurality of tunneling barrier gates, an end of each tunneling barrier gate is positioned on the top of a transversal side of an intersection of the transversal region and the longitudinal region of the P-type silicon region to locally control a potential in the channel; a plurality of coupling gates, an end of each coupling gate is positioned on the top of a point between the intersection and another intersection adjacent to the intersection to locally control the potential in the channel; and a plurality of sensor gates, an end of each sensor gate is positioned on the top of a center of the intersection to sense a state of a quantum dot formed at the intersection; and an inversion layer gate formed on the top of the P-type silicon region to control free electron density.