The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

Apr. 22, 2013
Applicants:

Yuuma Usui, Kanagawa, JP;

Shin-ichi Yusa, Hyogo, JP;

Inventors:

Yuuma Usui, Kanagawa, JP;

Shin-ichi Yusa, Hyogo, JP;

Assignees:

Ricoh Company, Ltd., Tokyo, JP;

University of Hyogo, Hyogo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 222/16 (2006.01); C08F 222/22 (2006.01); C08F 222/38 (2006.01); C08F 2/38 (2006.01); C08K 3/16 (2006.01); C08F 293/00 (2006.01); C08F 4/04 (2006.01);
U.S. Cl.
CPC ...
C08F 293/00 (2013.01); C08F 2/38 (2013.01); C08F 4/04 (2013.01); C08K 3/16 (2013.01); C08F 2438/03 (2013.01); C08F 293/005 (2013.01); C08K 2201/001 (2013.01);
Abstract

To provide an ABA triblock copolymer containing: an A-block having, in a constitutional unit thereof, a monomer represented by the following general formula (1) or a monomer represented by the following general formula (2); and a B-block having, in a constitutional unit thereof, a hydrophilic monomer having a radical polymerizable unsaturated bond, where Ris a hydrogen atom or a methyl group; Ris a C5-C18 alkylene group; M is a hydrogen atom or a monovalent metal atom; and Xis —NH— or an oxygen atom in the general formula (1), and where Ris a hydrogen atom or a methyl group; Ris a C5-C18 alkylene group; Rand Rare each independently a hydrogen atom, a methyl group, or an ethyl group; and Xis —NH— or an oxygen atom in the general formula (2).


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