The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

Nov. 15, 2006
Applicants:

Donal Bradley, Beaconsfield Bucks, GB;

John DE Mello, Teddington, GB;

Jingsong Huang, London, GB;

Inventors:

Donal Bradley, Beaconsfield Bucks, GB;

John De Mello, Teddington, GB;

Jingsong Huang, London, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B32B 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of patterning a thin film, comprising: depositing an intermediate, radiation sensitive, layer on a substrate; depositing the thin film on the intermediate layer, before or after deposition of the thin film: exposing the intermediate layer to patterned radiation in order to initiate a chemical reaction therein; and removing patterned radiation-defined parts of the intermediate layer and corresponding thin film, to leave patterned thin film and patterned intermediate layer on the substrate.


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