The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

Apr. 19, 2010
Applicants:

Kok Seng Lim, Victoria, AU;

Jonian Ivanov Nikolav, Victoria, AU;

Inventors:

Kok Seng Lim, Victoria, AU;

Jonian Ivanov Nikolav, Victoria, AU;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/00 (2006.01); B32B 17/00 (2006.01); B32B 19/00 (2006.01); B01J 27/00 (2006.01); B01J 21/00 (2006.01); B01J 37/02 (2006.01); C23C 18/12 (2006.01); B01J 29/06 (2006.01); B01J 37/34 (2006.01); B01J 23/75 (2006.01); B01J 2/16 (2006.01); B01J 23/00 (2006.01); B01J 35/00 (2006.01); B01J 2/00 (2006.01); B01J 23/745 (2006.01); B01J 23/80 (2006.01); B01J 23/06 (2006.01); B01J 8/18 (2006.01); B01J 23/10 (2006.01); B01J 23/70 (2006.01); B01J 23/04 (2006.01); B01J 23/38 (2006.01);
U.S. Cl.
CPC ...
B01J 2/006 (2013.01); B01J 37/0221 (2013.01); B01J 23/10 (2013.01); C23C 18/1258 (2013.01); B01J 29/06 (2013.01); B01J 37/349 (2013.01); B01J 23/75 (2013.01); B01J 2/16 (2013.01); B01J 23/002 (2013.01); B01J 23/70 (2013.01); B01J 23/04 (2013.01); B01J 35/006 (2013.01); B01J 23/745 (2013.01); B01J 35/002 (2013.01); B01J 23/80 (2013.01); B01J 23/38 (2013.01); B01J 2523/00 (2013.01); B01J 23/06 (2013.01); C23C 18/1216 (2013.01); B01J 8/1827 (2013.01); Y10S 977/773 (2013.01); Y10S 977/89 (2013.01);
Abstract

A process for depositing nanostructured material onto a particulate substrate material comprising the steps of: a) preparing a precursor material; b) forming an atomized dispersion containing nanophased material when subjecting said precursor material to elevated temperature; and c) contacting the atomized dispersion with the substrate material to deposit the nanophased material on the substrate material. The substrate material is in mobile and particulate form for contacting step (c). An apparatus for carrying out the process is also disclosed.


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