The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Aug. 17, 2009
Applicants:
Hartmut Rudmann, Jona, CH;
Susanne Westenhofer, Wettswil, CH;
Diane Morgan, Zurich, CH;
Inventors:
Assignee:
Heptagon Micro Optics Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
B29D 11/0073 (2013.01); G02B 3/0012 (2013.01); B29D 11/00278 (2013.01);
Abstract
A method wherein firstly a spacer arrangement and a first wafer are brought together with each other with a first portion of curable adhesive between a first side of the spacer arrangement and the first substrate, to produce a partial stack, and then a second wafer is brought together with a second side of the spacer arrangement, with a second portion of curable adhesive between the second side of the spacer arrangement and the second wafer. Then, the first portion of the curable adhesive and the second portion of the curable adhesive are cured simultaneously.