The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2014

Filed:

May. 10, 2012
Applicants:

Chia-yen Chan, Hsinchu, TW;

Shenq-tsong Chang, Hsinchu, TW;

Ting-ming Huang, Hsinchu, TW;

Po-han Huang, Hsinchu, TW;

Inventors:

Chia-Yen Chan, Hsinchu, TW;

Shenq-Tsong Chang, Hsinchu, TW;

Ting-Ming Huang, Hsinchu, TW;

Po-Han Huang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 13/00 (2006.01); G01B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention discloses a system and method for nondestructively measuring the refractive index and the central thickness of a lens. The system comprises a radius measurement module arranged for measuring the curvature radius of the first surface of the lens; a focus measurement module arranged for measuring the best focus distance of the first surface of the lens; and a calculation module arranged for performing the first or the second calculation process according to the lensmaker's formula. Wherein, when the central thickness is given, the calculation module performs the first calculation process according to the curvature radius, the best focus distance and the central thickness to calculate the refractive index. On the contrary, when the refractive index is given, the calculation module performs the second calculation process according to the curvature radius, the best focus distance and the refractive index to calculate the central thickness.


Find Patent Forward Citations

Loading…