The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2014

Filed:

May. 02, 2012
Applicants:

Toshiya Yokogawa, Nara, JP;

Junko Iwanaga, Osaka, JP;

Akira Inoue, Osaka, JP;

Inventors:

Toshiya Yokogawa, Nara, JP;

Junko Iwanaga, Osaka, JP;

Akira Inoue, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); H01L 33/32 (2010.01); H01L 33/02 (2010.01); H01L 33/16 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 33/02 (2013.01); H01L 33/16 (2013.01);
Abstract

A nitride-based semiconductor light-emitting device of an embodiment includes a semiconductor multilayer structure having a growing plane which is an m-plane and being made of a GaN-based semiconductor. The semiconductor multilayer structure includes a n-type semiconductor layer, a p-type semiconductor layer, a p-side electrode provided on the p-type semiconductor layer, and an active layer interposed between the n-type semiconductor layer and the p-type semiconductor layer. The ratio of the thickness of the active layer to the thickness of the n-type semiconductor layer, D, is in the range of 1.8×10≦D≦14.1×10. The area of the p-side electrode, S, is in the range of 1×10μm≦S≦9×10μm. A maximum current density which leads to 88% of a maximum of the external quantum efficiency is not less than 2 A/mm.


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