The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2014

Filed:

Nov. 08, 2011
Applicants:

Kazuhiro Yuasa, Takaoka, JP;

Ryuji Yamamoto, Tokyo, JP;

Inventors:

Kazuhiro Yuasa, Takaoka, JP;

Ryuji Yamamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/316 (2006.01); H01L 21/8242 (2006.01); H01L 21/31 (2006.01); H01L 27/108 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02263 (2013.01); H01L 21/02189 (2013.01); H01L 21/02175 (2013.01); C23C 16/452 (2013.01); C23C 16/45546 (2013.01); C23C 16/45534 (2013.01); C23C 16/40 (2013.01); H01L 21/02186 (2013.01); H01L 21/02183 (2013.01); H01L 21/02164 (2013.01); H01L 21/02181 (2013.01); H01L 21/0228 (2013.01);
Abstract

An oxide film is formed, having a specific film thickness on a substrate by alternately repeating: forming a specific element-containing layer on the substrate by supplying a source gas containing a specific element, to the substrate housed in a processing chamber and heated to a first temperature; and changing the specific element-containing layer formed on the substrate, to an oxide layer by supplying a reactive species containing oxygen to the substrate heated to the first temperature in the processing chamber under a pressure of less than atmospheric pressure, the reactive species being generated by causing a reaction between an oxygen-containing gas and a hydrogen-containing gas in a pre-reaction chamber under a pressure of less than atmospheric pressure and heated to a second temperature higher than the first temperature.


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