The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2014
Filed:
Oct. 19, 2011
Jong Sun Maeng, Gwangju, KR;
Ki Sung Kim, Gyunggi-do, KR;
Bum Joon Kim, Seoul, KR;
Suk Ho Yoon, Seoul, KR;
Hyun Seok Ryu, Gyunggi-do, KR;
Sung Tae Kim, Seoul, KR;
Jong Sun Maeng, Gwangju, KR;
Ki Sung Kim, Gyunggi-do, KR;
Bum Joon Kim, Seoul, KR;
Suk Ho Yoon, Seoul, KR;
Hyun Seok Ryu, Gyunggi-do, KR;
Sung Tae Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
Provided is a chemical vapor deposition (CVD) apparatus, including: a reaction chamber including an inner pipe having an internal space, and an external pipe configured to cover the inner pipe so as to maintain a sealing state thereof; a wafer holder disposed within the inner pipe and receiving a plurality of wafers stacked therein; and a gas supplier including at least one stem pipe disposed at the outside of the reaction chamber so as to supply a reactive gas thereto, a plurality of branch pipes connected to the stem pipe to introduce the reactive gas from the outside of the reaction chamber into the reaction chamber, and a plurality of spray nozzles provided with the branch pipes to spray the reactive gas to the plurality of respective wafers.