The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2014
Filed:
Dec. 06, 2011
Applicants:
Jozef Thomas Martinus Van Beek, Rosmalen, NL;
Klaus Reimann, Eindhoven, NL;
Remco Henricus Wilhelmus Pijnenburg, Hoogeloon, NL;
Twan Van Lippen, Bladel, NL;
Inventors:
Jozef Thomas Martinus Van Beek, Rosmalen, NL;
Klaus Reimann, Eindhoven, NL;
Remco Henricus Wilhelmus Pijnenburg, Hoogeloon, NL;
Twan Van Lippen, Bladel, NL;
Assignee:
NXP, B.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/84 (2006.01);
U.S. Cl.
CPC ...
Abstract
A MEMS manufacturing method and device in which a spacer layer is provided over a side wall of at least one opening in a structural layer which will define the movable MEMS element. The opening extends below the structural layer. The spacer layer forms a side wall portion over the side wall of the at least one opening and also extends below the level of the structural layer to form a contact area.