The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2014
Filed:
Jun. 09, 2010
Masahiro Suzuki, Kashiba, JP;
Toshiyuki Saito, Kashiba, JP;
Kazuyoshi Yamakawa, Nishinomiya, JP;
JTEKT Corporation, Osaka-shi, JP;
Abstract
The present invention provides a DLC film that has good adhesiveness even in a low-temperature environment, and a DLC film-forming method capable of forming this DLC film. The present invention also provides a DLC film that has excellent initial compatibility, and a DLC film-forming method capable of forming this DLC film. In the present invention, a first opposing surface () that faces an inner clutch plate, of a substrate () of an outer clutch plate () is covered by a DLC film (). Also, a treatment layer () is formed on a surface layer portion of the substrate (). The treatment layer () is formed by applying direct-current pulse voltage to the substrate (), and generating plasma in an atmosphere that contains argon gas and hydrogen gas.