The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2014
Filed:
Apr. 28, 2011
Son Nguyen-kim, Hemsbach, DE;
Rolf Werner, Ludwigshafen, DE;
Angelika Schmitt, Worms, DE;
Peter Hossel, Schifferstadt, DE;
Matthias Laubender, Schifferstadt, DE;
Jens Schröder, Frankenthal, DE;
Son Nguyen-Kim, Hemsbach, DE;
Rolf Werner, Ludwigshafen, DE;
Angelika Schmitt, Worms, DE;
Peter Hossel, Schifferstadt, DE;
Matthias Laubender, Schifferstadt, DE;
Jens Schröder, Frankenthal, DE;
BASF SE, Ludwigshafen, DE;
Abstract
The invention relates to a polymer suited for modifying the styling performance and the rheology of a cosmetic preparation, a composition thereof, a method of making it as well as the use of said polymer and the composition respectively. The copolymer comprises at least one non-ionic ethylenically unsaturated C1-C4 (meth)acrylate as monomer A; an ethylenically unsaturated monomer B having as hydrogen bond donor an amide group, said ethylenically unsaturated monomer B being an ethylenically unsaturated monomer having a cyclic amide moiety, as monomer B1 and/or, an ethylenically unsaturated monomer having an acyclic amide group, as monomer B2; at least one ethylenically unsaturated carboxylic acid as monomer C; a macromonomer D; optionally at least one cross-linker E; and optionally at least one further monomer F.