The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8821821 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 02, 2014

Filed:

Aug. 03, 2011
Applicants:

Oliviero Diana, Vilvoorde, BE;

Peter M. Predikant, Hannover, DE;

Philippe Morelle, Alsemberg, BE;

Maurizio Paganin, Brussels, BE;

Christoph Sommer, Neckarsulm, DE;

Inventors:

Oliviero Diana, Vilvoorde, BE;

Peter M. Predikant, Hannover, DE;

Philippe Morelle, Alsemberg, BE;

Maurizio Paganin, Brussels, BE;

Christoph Sommer, Neckarsulm, DE;

Assignee:

Solvay SA, Brussels, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/56 (2006.01); C01B 7/00 (2006.01); C01B 7/19 (2006.01); H01L 21/306 (2006.01); C01B 7/20 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C01B 7/20 (2013.01); C01B 7/197 (2013.01); H01L 21/30604 (2013.01); H01L 21/02057 (2013.01);
Abstract

Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of entrained electrolyte salt in solid form as impurity. The invention concerns a process for the purification of such impure elemental fluorine by contact with liquid hydrogen fluoride, e.g., in a jet gas scrubber or by bubbling the raw fluorine through liquid hydrogen fluoride. After this purification step, any entrained hydrogen fluoride is removed by adsorption, condensing it out or both. After passing through a filter with very small pores, the purified fluorine is especially suited for the semiconductor industry as etching gas or as chamber cleaning gas in the manufacture of semiconductors, TFTs and solar cells, or for the manufacture of micro-electromechanical systems ('MEMS').


Find Patent Forward Citations

Diana, Oliviero. (2014). Method for the purification of fluorine (U.S. Patent No. 8821821). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8821821

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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