The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2014

Filed:

Dec. 06, 2010
Applicants:

Seyed G Saddoughi, Clifton Park, NY (US);

Grover Bennett, Jr., Schenectady, NY (US);

Inventors:

Seyed G Saddoughi, Clifton Park, NY (US);

Grover Bennett, Jr., Schenectady, NY (US);

Assignee:

Lockheed Martin Corporation, Bethesda, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/08 (2006.01); H01L 41/09 (2006.01);
U.S. Cl.
CPC ...
H01L 41/0973 (2013.01);
Abstract

A heat resistant piezo bimorph synthetic jet apparatus comprises a working fluid chamber partially defined by a plate, a working fluid port that provides fluid flow communication between the working fluid chamber and a working fluid mass, and a bimorph piezoelectric structure included in the plate. The bimorph piezoelectric structure alternately increases and decreases chamber volume by alternately expanding convexly and concavely in response to application of voltage of alternating polarity to alternately draw working fluid into and expel working fluid from the working fluid chamber through the working fluid port. A thermal insulating layer is disposed between the working fluid chamber and the bimorph piezoelectric structure to protect a ceramic layer within the first bimorph piezoelectric structure from high temperature working fluid.


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