The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Nov. 21, 2008
David Morgan-mar, Wollstonecraft, AU;
Stephen James Hardy, West Pymble, AU;
Matthew R Arnison, Umina, AU;
Kieran Gerard Larkin, Putney, AU;
Christine Anne Deller, Mount Kurring-gai, AU;
David Morgan-Mar, Wollstonecraft, AU;
Stephen James Hardy, West Pymble, AU;
Matthew R Arnison, Umina, AU;
Kieran Gerard Larkin, Putney, AU;
Christine Anne Deller, Mount Kurring-gai, AU;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Disclosed is a method of determining at least one three-dimensional (3D) geometric parameter of an imaging device. A two-dimensional (2D) target image is provided having a plurality of alignment patterns. The target image is imaged with an imaging device to form a captured image. At least one pattern of the captured image is compared with a corresponding pattern of the target image. From the comparison, the geometric parameter of the imaging device is then determined. The alignment patterns include at least one of (i) one or more patterns comprising a 2D scale and rotation invariant basis function, (ii) one or more patterns comprising a 1D scale invariant basis function, and (iii) one or more patterns having a plurality of grey levels and comprising a plurality of superimposed sinusoidal patterns, the plurality of sinusoidal patterns having a plurality of predetermined discrete orientations. Also disclosed is a two-dimensional test chart for use in testing an imaging device, the test chart comprising a plurality of alignment patterns, at least one of said alignment patterns including one of those patterns mentioned above.